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dc.contributor.authorNi, C.
dc.contributor.authorWang, W. G.
dc.contributor.authorWeiland, C.
dc.contributor.authorShah, L. R.
dc.contributor.authorFan, X.
dc.contributor.authorParson, P.
dc.contributor.authorMiao, Guoxing
dc.contributor.authorJordan-Sweet, J.
dc.contributor.authorKou, X. M.
dc.contributor.authorZhang, Y. P.
dc.contributor.authorStearrett, R.
dc.contributor.authorNowak, E. R.
dc.contributor.authorOpila, R.
dc.contributor.authorMoodera, Jagadeesh
dc.contributor.authorXiao, J. Q.
dc.date.accessioned2010-09-30T14:35:58Z
dc.date.available2010-09-30T14:35:58Z
dc.date.issued2010-04
dc.date.submitted2010-03
dc.identifier.issn1098-0121
dc.identifier.issn1550-235X
dc.identifier.urihttp://hdl.handle.net/1721.1/58778
dc.description.abstractThe competition between the interface crystallization and diffusion processes, their influence on the onset of symmetry-filtering coherent tunneling of Δ1 band electrons in the MgO-based magnetic tunnel junctions is investigated. Systematic study of the transport and magnetoresistance during thermal annealing of these junctions shows a unique behavior of the tunneling conductance in the parallel state. The optimal annealing time for achieving giant tunneling magnetoresistance at different temperatures is determined. The evolution of magnetoresistance consists of three distinct regions, responsible by different contributions from CoFeB electrodes and the MgO barrier. The whole phenomenon can be understood through an empirical model based on the Landauer tunneling picture.en_US
dc.description.sponsorshipUnited States. Dept. of Energy (Grant No. DE-FG02-07ER46374)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (DMR0827249)en_US
dc.description.sponsorshipNational Science Foundation (U.S.) (Grant No. DMR0504158)en_US
dc.description.sponsorshipUnited States. Office of Naval Research (Grant No. N00014-09-1-0177)en_US
dc.description.sponsorshipUnited States. Dept. of Energy. Office of Science (No. DE-AC02- 98CH10886)en_US
dc.language.isoen_US
dc.publisherAmerican Physical Societyen_US
dc.relation.isversionofhttp://dx.doi.org/10.1103/PhysRevB.81.144406en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceAPSen_US
dc.titleUnderstanding tunneling magnetoresistance during thermal annealing in MgO-based junctions with CoFeB electrodesen_US
dc.typeArticleen_US
dc.identifier.citationWang, W.G. et al. "Understanding tunneling magnetoresistance during thermal annealing in MgO-based junctions with CoFeB electrodes." Physical Review B 81.14 (2010): 144406. © 2010 The American Physical Societyen_US
dc.contributor.departmentFrancis Bitter Magnet Laboratory (Massachusetts Institute of Technology)en_US
dc.contributor.approverMoodera, Jagadeesh
dc.contributor.mitauthorMiao, Guoxing
dc.contributor.mitauthorMoodera, Jagadeesh
dc.relation.journalPhysical Review Ben_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsWang, W. G.; Ni, C.; Miao, G. X.; Weiland, C.; Shah, L. R.; Fan, X.; Parson, P.; Jordan-sweet, J.; Kou, X. M.; Zhang, Y. P.; Stearrett, R.; Nowak, E. R.; Opila, R.; Moodera, J. S.; Xiao, J. Q.en
dc.identifier.orcidhttps://orcid.org/0000-0002-2480-1211
dspace.mitauthor.errortrue
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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