Polymer photochemistry at the EUV wavelength
Name
Fedynyshyn-2010-Polymer photochemistry at the EUV wavelength.pdf
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490.35 KB
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Author(s)
Fedynyshyn, Theodore H.
Goodman, Russell B.
Cabral, Alberto
Tarrio, Charles
Lucatorto, Thomas B.
Date Issued
March 2010
Journal
Proceedings of SPIE--the International Society for Optical Engineering
Publisher
SPIE
Citation
Theodore H. Fedynyshyn, Russell B. Goodman, Alberto Cabral, Charles Tarrio and Thomas B. Lucatorto, "Polymer photochemistry at the EUV wavelength", Proc. SPIE 7639, 76390A (2010); doi:10.1117/12.845997 © 2010 COPYRIGHT SPIE
Version
Final published version
Abstract
The higher energy associated with extreme ultraviolet (EUV) radiation coupled with the high absorptivity of most organic polymers at these wavelengths should lead to increased excited state population and higher quantum yields of photoproducts. Polymers representative of those commonly employed in resists as well as some model polymers were selected for this study. Polymer photochemistry at EUV was catalogued as to the effect of absorbed 13.4-nm radiation on a polymer's quantum yield of chain scission (Φs) and crosslinking (Φx). In selected cases, the chain scission and crosslinking quantum yields were also compared to those previously determined at 157-, 193- and 248-nm. It was found that quantum yield values were over a magnitude greater at EUV relative to optical wavelengths.
MIT Department
Lincoln Laboratory
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1117/12.845997
