A novel sublimable mask lift-off method for patterning thin films

Author(s)
Bahlke, Matthias Erhard
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Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Advisor
Marc A. Baldo.
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Abstract
Photolithography's accuracy and scalability has made it the method for sub-micron-scale definition of single-crystal semiconductor devices for over half a century. Unfortunately, organic semiconductor devices are chemically incompatible with the types of resists, solvents, and etchants traditionally used. This work investigates the use of a chemically inert resist that relies on phase changes for lift-off patterning thin films of organic semiconductors and metals.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
 
Cataloged from PDF version of thesis.
 
Includes bibliographical references (p. 39-42).
 
Date issued
2011
URI
http://hdl.handle.net/1721.1/65325
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science.
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