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dc.contributor.advisorTonio Buonassisi.en_US
dc.contributor.authorBrandt, Riley Ericen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Mechanical Engineering.en_US
dc.date.accessioned2012-01-11T20:18:28Z
dc.date.available2012-01-11T20:18:28Z
dc.date.copyright2011en_US
dc.date.issued2011en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/68197
dc.descriptionThesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2011.en_US
dc.descriptionThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.en_US
dc.descriptionCataloged from student submitted PDF version of thesis.en_US
dc.descriptionIncludes bibliographical references (p. 58-60).en_US
dc.description.abstractFuture fossil fuel scarcity and environmental degradation have demonstrated the need for renewable, low-carbon sources of energy to power an increasingly industrialized world. Solar energy, with its extraordinary resource base, is one of the most feasible long-term options for satisfying energy demand with minimal environmental impact. However, solar photovoltaic panels remain expensive and employ materials whose resource bases cannot satisfy global, terawatt-level penetration. This necessitates the development of cheap, earth-abundant semiconductors for solar conversion such as cuprous oxide (Cu₂O). Poor solar energy conversion efficiency (<2%) has hindered the development of this material, yet it is not well understood what is preventing the material from approaching the idealized maximum efficiency of 20%. The present work aims to develop a thorough characterization method for Cu₂O thin films fabricated through a physical vapor deposition (PVD) process known as reactive direct-current magnetron sputtering. This both provides a platform for material analysis and an opportunity to adapt a typically high-throughput manufacturing method to make high quality thin films. Spectrophotometry, Hall Effect mobility measurement, and photoelectrochemical cell techniques are used in succession to determine the absorption and transport properties. The films are found to have a direct forbidden bandgap of 1.93 eV, with an absorption coefficient of greater than 10⁵ cm-¹ for photons carrying energy in excess of 2.6 eV. Majority carrier mobility is measured as 58.1 cm²/V·s, approaching the levels of monocrystalline oxidized films in literature. These high mobilities indicate that with carrier lifetime >10 nanoseconds, minority carrier diffusion length could easily exceed the film thickness. The photoelectrochemical minority carrier diffusion length measurement achieves success on gallium arsenide test samples, determining flat-band potential, quantum efficiency, and minority carrier diffusion length, paving the way for future Cu₂O measurement. Future work may apply this test procedure to fully characterize other materials, and eventually lead to solar cell fabrication.en_US
dc.description.statementofresponsibilityby Riley Eric Brandt.en_US
dc.format.extent60 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectMechanical Engineering.en_US
dc.titleDeveloping cuprous oxide thin film characterization techniques to illuminate efficiency-limiting mechanisms in photovoltaic applicationsen_US
dc.typeThesisen_US
dc.description.degreeS.B.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc770910506en_US


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