A comparison of AB diblock and ABA triblock copolymers of polystyrene and polyferocenylsilane for nanolithography applications

Abstract

Block coopolymers(BCP) have become of interest in the pursuit novel methods of nanolithography. Their ability to self-assembly into periodic geometries with nanoscale feature sizes makes them attractive as etching masks and templating materials for microelectronics and nanodevices. BCP provide a scalable and low-cost method that is compatible with existing semiconductor fabrication technologies. Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers.