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dc.contributor.authorLiu, Jifeng
dc.contributor.authorSun, Xiaochen
dc.contributor.authorMichel, Jurgen
dc.contributor.authorKimerling, Lionel C.
dc.contributor.authorCamacho-Aguilera, Rodolfo Ernesto
dc.contributor.authorCai, Yan
dc.date.accessioned2013-08-14T17:04:47Z
dc.date.available2013-08-14T17:04:47Z
dc.date.issued2010-12
dc.identifier.isbn978-1-4424-7418-5
dc.identifier.urihttp://hdl.handle.net/1721.1/79868
dc.description.abstractWe report optically-pumped Ge-on-Si lasers with direct gap emission near 1600 nm at room temperature. The Ge-on-Si material was band-engineered by tensile strain and n-type doping to compensate the energy difference between direct and indirect band gaps for efficient light emission. Modeling of Ge/Si double heterojunction LEDs shows that it is possible to achieve >;10% quantum efficiency even assuming an Auger coefficient 10 times larger than reports in literature. Edge-emitting Ge-on-Si waveguide LEDs have also been demonstrated at room temperature. These simulation and experimental results strongly indicate the feasibility of electrically-pumped Ge-on-Si lasers.en_US
dc.language.isoen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.isversionofhttp://dx.doi.org/10.1109/IEDM.2010.5703311en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceIEEEen_US
dc.titleBand-engineered Ge-on-Si lasersen_US
dc.typeArticleen_US
dc.identifier.citationLiu, Jifeng, Xiaochen Sun, Rodolfo Camacho-Aguilera, Yan Cai, Jurgen Michel, and Lionel C. Kimerling. “Band-engineered Ge-on-Si lasers.” In 2010 International Electron Devices Meeting, 6.6.1-6.6.4. Institute of Electrical and Electronics Engineers, 2010. © 2010 IEEEen_US
dc.contributor.departmentMIT Materials Research Laboratoryen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Microphotonics Centeren_US
dc.contributor.mitauthorSun, Xiaochenen_US
dc.contributor.mitauthorCamacho-Aguilera, Rodolfo Ernestoen_US
dc.contributor.mitauthorCai, Yanen_US
dc.contributor.mitauthorMichel, Jurgenen_US
dc.contributor.mitauthorKimerling, Lionel C.en_US
dc.contributor.mitauthorLiu, Jifengen_US
dc.relation.journal2010 IEEE International Electron Devices Meeting (IEDM)en_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/ConferencePaperen_US
eprint.statushttp://purl.org/eprint/status/NonPeerRevieweden_US
dspace.orderedauthorsLiu, Jifeng; Sun, Xiaochen; Camacho-Aguilera, Rodolfo; Yan Cai, Rodolfo; Michel, Jurgen; Kimerling, Lionel C.en_US
dc.identifier.orcidhttps://orcid.org/0000-0002-3913-6189
mit.licensePUBLISHER_POLICYen_US
mit.metadata.statusComplete


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