| dc.contributor.author | Liu, Jifeng | |
| dc.contributor.author | Sun, Xiaochen | |
| dc.contributor.author | Michel, Jurgen | |
| dc.contributor.author | Kimerling, Lionel C. | |
| dc.contributor.author | Camacho-Aguilera, Rodolfo Ernesto | |
| dc.contributor.author | Cai, Yan | |
| dc.date.accessioned | 2013-08-14T17:04:47Z | |
| dc.date.available | 2013-08-14T17:04:47Z | |
| dc.date.issued | 2010-12 | |
| dc.identifier.isbn | 978-1-4424-7418-5 | |
| dc.identifier.uri | http://hdl.handle.net/1721.1/79868 | |
| dc.description.abstract | We report optically-pumped Ge-on-Si lasers with direct gap emission near 1600 nm at room temperature. The Ge-on-Si material was band-engineered by tensile strain and n-type doping to compensate the energy difference between direct and indirect band gaps for efficient light emission. Modeling of Ge/Si double heterojunction LEDs shows that it is possible to achieve >;10% quantum efficiency even assuming an Auger coefficient 10 times larger than reports in literature. Edge-emitting Ge-on-Si waveguide LEDs have also been demonstrated at room temperature. These simulation and experimental results strongly indicate the feasibility of electrically-pumped Ge-on-Si lasers. | en_US |
| dc.language.iso | en_US | |
| dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en_US |
| dc.relation.isversionof | http://dx.doi.org/10.1109/IEDM.2010.5703311 | en_US |
| dc.rights | Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. | en_US |
| dc.source | IEEE | en_US |
| dc.title | Band-engineered Ge-on-Si lasers | en_US |
| dc.type | Article | en_US |
| dc.identifier.citation | Liu, Jifeng, Xiaochen Sun, Rodolfo Camacho-Aguilera, Yan Cai, Jurgen Michel, and Lionel C. Kimerling. “Band-engineered Ge-on-Si lasers.” In 2010 International Electron Devices Meeting, 6.6.1-6.6.4. Institute of Electrical and Electronics Engineers, 2010. © 2010 IEEE | en_US |
| dc.contributor.department | MIT Materials Research Laboratory | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Microphotonics Center | en_US |
| dc.contributor.mitauthor | Sun, Xiaochen | en_US |
| dc.contributor.mitauthor | Camacho-Aguilera, Rodolfo Ernesto | en_US |
| dc.contributor.mitauthor | Cai, Yan | en_US |
| dc.contributor.mitauthor | Michel, Jurgen | en_US |
| dc.contributor.mitauthor | Kimerling, Lionel C. | en_US |
| dc.contributor.mitauthor | Liu, Jifeng | en_US |
| dc.relation.journal | 2010 IEEE International Electron Devices Meeting (IEDM) | en_US |
| dc.eprint.version | Final published version | en_US |
| dc.type.uri | http://purl.org/eprint/type/ConferencePaper | en_US |
| eprint.status | http://purl.org/eprint/status/NonPeerReviewed | en_US |
| dspace.orderedauthors | Liu, Jifeng; Sun, Xiaochen; Camacho-Aguilera, Rodolfo; Yan Cai, Rodolfo; Michel, Jurgen; Kimerling, Lionel C. | en_US |
| dc.identifier.orcid | https://orcid.org/0000-0002-3913-6189 | |
| mit.license | PUBLISHER_POLICY | en_US |
| mit.metadata.status | Complete | |