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dc.contributor.authorGhebrebrhan, Michael
dc.contributor.authorBermel, Peter A.
dc.contributor.authorJoannopoulos, John D.
dc.contributor.authorJohnson, Steven G.
dc.contributor.authorAvniel, Yehuda B.
dc.date.accessioned2013-08-26T19:06:03Z
dc.date.available2013-08-26T19:06:03Z
dc.date.issued2009-04
dc.date.submitted2009-03
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1721.1/80276
dc.description.abstractThe front-coating (FC) of a solar cell controls its efficiency, determining admission of light into the absorbing material and potentially trapping light to enhance thin absorbers. Single-layer FC designs are well known, especially for thick absorbers where their only purpose is to reduce reflections. Multilayer FCs could improve performance, but require global optimization to design. For narrow bandwidths, one can always achieve nearly 100% absorption. For the entire solar bandwidth, however, a second FC layer improves performance by 6.1% for 256 μm wafer-based cells, or by 3.6% for 2 μm thin-film cells, while additional layers yield rapidly diminishing returns.en_US
dc.description.sponsorshipNational Science Foundation (U.S.). Materials Research Science and Engineering Centers (Program) (Grant DMR 02-13282)en_US
dc.description.sponsorshipMassachusetts Institute of Technology. Institute for Soldier Nanotechnologies (United States. Army Research Office Contract DAAD-19-02-D0002)en_US
dc.language.isoen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.17.007505en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleGlobal optimization of silicon photovoltaic cell front coatingsen_US
dc.typeArticleen_US
dc.identifier.citationGhebrebrhan, Michael, Peter Bermel, Yehuda Avniel, John D. Joannopoulos, and Steven G. Johnson. “Global optimization of silicon photovoltaic cell front coatings.” Optics Express 17, no. 9 (April 22, 2009): 7505. © 2009 Optical Society of Americaen_US
dc.contributor.departmentMassachusetts Institute of Technology. Institute for Soldier Nanotechnologiesen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mathematicsen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Physicsen_US
dc.contributor.mitauthorGhebrebrhan, Michaelen_US
dc.contributor.mitauthorBermel, Peter A.en_US
dc.contributor.mitauthorAvniel, Yehuda B.en_US
dc.contributor.mitauthorJoannopoulos, John D.en_US
dc.contributor.mitauthorJohnson, Steven G.en_US
dc.relation.journalOptics Expressen_US
dc.eprint.versionFinal published versionen_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dspace.orderedauthorsGhebrebrhan, Michael; Bermel, Peter; Avniel, Yehuda; Joannopoulos, John D.; Johnson, Steven G.en_US
dc.identifier.orcidhttps://orcid.org/0000-0001-7327-4967
dc.identifier.orcidhttps://orcid.org/0000-0001-5994-0396
dc.identifier.orcidhttps://orcid.org/0000-0002-7244-3682
dspace.mitauthor.errortrue
mit.licensePUBLISHER_POLICYen_US


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