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dc.contributor.advisorDimitri A. Antoniadis.en_US
dc.contributor.authorRitenour, Andrew P. (Andrew Paul), 1974-en_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2013-09-12T19:12:52Z
dc.date.available2013-09-12T19:12:52Z
dc.date.copyright1999en_US
dc.date.issued1999en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/80598
dc.descriptionThesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.en_US
dc.descriptionIncludes bibliographical references (p. 49).en_US
dc.description.statementofresponsibilityby Andrew P. Ritenour.en_US
dc.format.extent50 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.titleFabrication technology for double-gate field effect transistorsen_US
dc.typeThesisen_US
dc.description.degreeS.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc44415942en_US


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