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dc.contributor.advisorTonio Buonassisi.en_US
dc.contributor.authorSiah, Sin Chengen_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Mechanical Engineering.en_US
dc.date.accessioned2013-11-18T19:05:38Z
dc.date.available2013-11-18T19:05:38Z
dc.date.copyright2013en_US
dc.date.issued2013en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/82298
dc.descriptionThesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2013.en_US
dc.descriptionCataloged from PDF version of thesis.en_US
dc.descriptionIncludes bibliographical references (p. 84-86).en_US
dc.description.abstractOne of the key technological objectives to further decrease the cost of silicon (Si) PV and enable manufacturing of crystalline silicon is to improve the quality of thin, kerfless Si wafers to monocrystalline equivalent. To aid wafer manufacturers to develop high-quality thin Si wafer substrates, performance-limiting defects in the bulk of thin kerfless Si wafers must be identified, and a means to accurately measure the bulk lifetime is necessary. With decreasing wafer thickness, however, the impact of surface recombination increases and dominates the effective lifetime measured by conventional methods. Therefore, the ability to decouple bulk-limited lifetime from surface-limited lifetime is desirable, ideally without the need for surface passivation. Herein, spectrally resolved transient absorption pump-probe spectroscopy and extensive Technology Computer Aided Design simulations are used to decouple the bulk- and surface-limited lifetimes of thin kerfless silicon wafers in a single measurement. A range of sample conditions are studied. It is observed that the technique can successfully provide reasonable upper and lower limits to the bulk and surface recombination parameters for thin kerfless silicon wafers.en_US
dc.description.statementofresponsibilityby Sin Cheng Siah.en_US
dc.format.extent86 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectMechanical Engineering.en_US
dc.titleDecoupling bulk- and surface-limited lifetimes in thin kerfless silicon wafers using spectrally resolved transient absorption pump-probe spectroscopy and computer simulationsen_US
dc.typeThesisen_US
dc.description.degreeS.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc861347367en_US


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