MIT Libraries logoDSpace@MIT

MIT
View Item 
  • DSpace@MIT Home
  • MIT Libraries
  • MIT Theses
  • Doctoral Theses
  • View Item
  • DSpace@MIT Home
  • MIT Libraries
  • MIT Theses
  • Doctoral Theses
  • View Item
JavaScript is disabled for your browser. Some features of this site may not work without it.

Effect of MOSFET threshold voltage variation on high-performance circuits

Author(s)
Narendra, Siva G. (Siva Gurusami), 1971-
Thumbnail
DownloadFull printable version (10.22Mb)
Alternative title
Effect of Metal oxide semiconductor field-effect transistors threshold voltage variation on high-performance circuits
Other Contributors
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Advisor
Anantha Chandrakasan and Dimitri Antoniadis.
Terms of use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582
Metadata
Show full item record
Abstract
The driving force for the semiconductor industry growth has been the elegant scaling nature of CMOS technology. In future CMOS technology generations, supply and threshold voltages will have to continually scale to sustain performance increase, limit energy consumption, control power dissipation, and maintain reliability. These continual scaling requirements on supply and threshold voltages pose several technology and circuit design challenges. One such challenge is the expected increase in threshold voltage variation due to worsening short channel effect. This thesis will address three specific circuit design challenges arising from increased threshold voltage variation and present prospective solutions. First, with supply voltage scaling, control of die-to-die threshold voltage variation becomes critical for maintaining high yield. An analytical model will be developed for existing circuit technique that adaptively biases the body terminal of MOSFET devices to control this threshold voltage variation. Based on this model, recommendations on how to effectively use the technique in future technologies will be presented. Second, with threshold voltage scaling, sub-threshold leakage power is expected to be a significant portion of total power in future CMOS systems. Therefore, it becomes imperative to accurately predict and minimize leakage power of such systems, especially with increasing within-die threshold voltage variation. A model that predicts system leakage based on first principles will be presented and a circuit technique to reduce system leakage without reducing system performance will be discussed.
 
(cont.) Finally, due to different processing steps and short channel effects, threshold voltage of devices of same or different polarities in the same neighborhood may not be matched. This will introduce mismatch in the device drive currents that will not be acceptable in some high performance circuits. In the last part of the thesis, voltage and current biasing schemes that minimize the impact of neighborhood threshold voltage mismatch will be introduced.
 
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2002.
 
Includes bibliographical references (p. 95-101).
 
Date issued
2002
URI
http://hdl.handle.net/1721.1/8341
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science.

Collections
  • Doctoral Theses

Browse

All of DSpaceCommunities & CollectionsBy Issue DateAuthorsTitlesSubjectsThis CollectionBy Issue DateAuthorsTitlesSubjects

My Account

Login

Statistics

OA StatisticsStatistics by CountryStatistics by Department
MIT Libraries
PrivacyPermissionsAccessibilityContact us
MIT
Content created by the MIT Libraries, CC BY-NC unless otherwise noted. Notify us about copyright concerns.