| dc.contributor.advisor | Dimitri A. Antoniadis. | en_US |
| dc.contributor.author | Lauer, Isaac, 1976- | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. | en_US |
| dc.date.accessioned | 2014-05-07T17:05:16Z | |
| dc.date.available | 2014-05-07T17:05:16Z | |
| dc.date.copyright | 2001 | en_US |
| dc.date.issued | 2001 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/86778 | |
| dc.description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2001. | en_US |
| dc.description | Includes bibliographical references (p. 63-66). | en_US |
| dc.description.statementofresponsibility | by Isaac Lauer. | en_US |
| dc.format.extent | 66 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science. | en_US |
| dc.title | Double-sided CMOS fabrication technology | en_US |
| dc.title.alternative | Double-sided complementary metal oxide semiconductor fabrication technology | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | S.M. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 49887732 | en_US |
