Characterization of optical interconnects
Author(s)Sam, Shiou Lin, 1976-
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Duane Boning and Anantha Chandrakasan.
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Interconnect has become a major issue in deep sub-micron technology. Even with copper and low-k dielectrics, parasitic effects of interconnects will eventually impede advances in integrated electronics. One technique that has the potential to provide a paradigm shift is optics. This project evaluates the feasibility of optical interconnects for distributing data and clock signals. In adopting this scheme, variation is introduced by the detector, the waveguides, and the optoelectronic circuit, which includes device, power supply and temperature variations. We attempt to characterize the effects of the aforementioned sources of variation by designing a baseline optoelectronic circuitry and fabricating a test chip which consists of the circuitry and detectors. Simulations are also performed to supplement the effort. The results are compared with the performance of traditional metal interconnects. The feasibility of optical interconnects is found to be sensitive to the optoelectronic circuitry used. Variation effects from the devices and operating conditions have profound impact on the performance of optical interconnects since they introduce substantial skew and delay in the otherwise ideal system.
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000.Includes bibliographical references (p. 72-75).
DepartmentMassachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology
Electrical Engineering and Computer Science.