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dc.contributor.advisorKaren K. Gleason.en_US
dc.contributor.authorPetruczok, Christy D. (Christy Danielle)en_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Chemical Engineering.en_US
dc.date.accessioned2014-09-19T21:30:24Z
dc.date.available2014-09-19T21:30:24Z
dc.date.copyright2014en_US
dc.date.issued2014en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/89947
dc.descriptionThesis: Ph. D., Massachusetts Institute of Technology, Department of Chemical Engineering, 2014.en_US
dc.descriptionCataloged from PDF version of thesis.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.abstractInitiated Chemical Vapor Deposition (iCVD) is a versatile, one-step process for synthesizing conformal and functional polymer thin films on a variety of substrates. This thesis emphasizes the development of tools to further enable the use of iCVD for industrial applications. The ability to pattern polymer thin films is a prerequisite for device fabrication. Two methods were developed for patterning iCVD polymers. The first technique facilitated patterning of nano- and microscale features of any iCVD thin film on planar surfaces. Retention of polymer functionality was demonstrated by incorporating the features into high-resolution resistive sensors. The second method adapted photolithographic techniques to achieve patterning on highly curved surfaces. Non-planar substrates were coated with a uniform layer of a functionalized, photoreactive iCVD polymer and exposed to ultraviolet light through a flexible mask. Exposed regions became insoluble in a developing solvent. The resolution and sensitivity of this iCVD-based negative photoresist were comparable to those of commercial products. Additionally, the patterned polymer was used as a mask for patterning metal on planar and curved surfaces. iCVD is typically a semi-continuous process. A batch process was investigated in order to minimize the use of expensive and corrosive reactants. The chemical functionality and conformality of the films were unaffected by the change in processing mode. Reaction yield was improved by one to two orders of magnitude for several film chemistries. iCVD is also unique in that it enables the deposition of cross-linked polymer films, which are difficult to create using conventional, solution-based methods. To potentially enhance durability, cross-linked poly(divinylbenzene) and poly(4-vinylpyridine-co-divinylbenzene) films were synthesized via iCVD. This is the first vapor-phase synthesis of the copolymer, which is a major component of many commercial ion exchange membranes. The degree of cross-linking was quantified using spectroscopic methods and was tightly controlled by adjusting the flow rate of divinylbenzene. Corresponding changes in the elastic moduli of the films were confirmed using nanoindentation. The first vapor-phase synthesis of poly(vinyl cinnamate) was also demonstrated. The cross-linking density of this polymer increases upon exposure to ultraviolet light and is readily quantifiable. Vinyl cinnamate was incorporated into a copolymer with N-isopropylacrylamide, yielding a temperature and light-responsive thin film.en_US
dc.description.statementofresponsibilityby Christy D. Petruczok.en_US
dc.format.extent178 pagesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectChemical Engineering.en_US
dc.titleEnabling integration of vapor-deposited polymer thin filmsen_US
dc.typeThesisen_US
dc.description.degreePh. D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc890125317en_US


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