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dc.contributor.authorUhm, H.S.en_US
dc.contributor.authorDavidson, R.C.en_US
dc.date.accessioned2015-02-11T22:27:53Z
dc.date.available2015-02-11T22:27:53Z
dc.date.issued2015-02-11
dc.identifier78ja007en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/94469
dc.publisherMIT Plasma Science and Fusion Centeren_US
dc.titleStability properties of a field-reversed ion layer in a background plasmaen_US


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