Zone plate array lithography in the deep UV

Abstract

Initial design and development of a new paradigm in nanolithography, zone plate array lithography (ZPAL), has yielded a clearer understanding of its operation, construction, and performance. The benefits of ZPAL as a maskless strategy to write arbitrary patterns with ~ 25 nm resolution are explored. To optimize the properties of the system required proper design of zone plate focusing. Due to ZPAL's universality, the study has been conducted in the deep UV; a process to create zone plates with 250 nm theoretical spots sizes for this regime was developed. Familiarity with nanofabrication technology proved essential, especially e-beam lithography. Next, an optical setup was built replete with alignment interferometry, precision stage motion, and radiation from a 193 nm ArF laser. A rubric for the implementation of the multiplexing coupled with coordination architecture demonstrated a potentially high throughput of l cm2 / s. Moreover, the results of exposure tests show digital pattern generation from an array of beamlets. Because the ideal ZPAL system would function with x-rays, a discussion on its design and practical development has been included. Despite anticipated hurdles, spearheading this venture promises to drive lithography to its limit.