2026-09-20T20:40:29Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/1006892026-06-06T00:55:45Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
Karl K. Berggren.
Oser, Kameron L
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2016-01-04T20:53:44Z
2016-01-04T20:53:44Z
2014
2015
http://hdl.handle.net/1721.1/100689
933249791
Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, February 2015.
"September 2014." Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 54-58).
The doubling of block copolymer (BCP) line patterns by electron-beam-fabricated template patterns is presented. Difficulties in achieving low defect self-assembly within the narrow line patterns are discussed. To address these issues, experimental approaches were investigated of narrowing the polymer's minority block through solvent annealing, and adjusting length of the polymer brush responsible for functionalizing the template lines. While narrowed polymer lines were not achieved through solvent annealing, low defect self-assembly of BCP within doubling template patterns was achieved by utilizing a polymer brush of high molecular weight (28 kg mol -1).
by Kameron L. Oser.
M.Eng.
58 pages
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science.
Doubling of block copolymer line patterns by electron-beam-fabricated templates
Doubling of BCP line patterns by electron-beam-fabricated templates
Thesis
application/pdf
Publication
unknown
unknown
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="c4d6863c-208d-47bb-a5da-68b58375ea30">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>Doubling of block copolymer line patterns by electron-beam-fabricated templates</Title>
<Subtitle>Doubling of BCP line patterns by electron-beam-fabricated templates</Subtitle>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>2015</PublicationDate>
<Authors>
<Author>
<DisplayName>Oser, Kameron L</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Electrical Engineering and Computer Science.</Keyword>
<Abstract>The doubling of block copolymer (BCP) line patterns by electron-beam-fabricated template patterns is presented. Difficulties in achieving low defect self-assembly within the narrow line patterns are discussed. To address these issues, experimental approaches were investigated of narrowing the polymer's minority block through solvent annealing, and adjusting length of the polymer brush responsible for functionalizing the template lines. While narrowed polymer lines were not achieved through solvent annealing, low defect self-assembly of BCP within doubling template patterns was achieved by utilizing a polymer brush of high molecular weight (28 kg mol -1).</Abstract>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>