<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-19T20:11:22Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/103724" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/103724</identifier><datestamp>2026-06-16T18:53:11Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131022</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Jing Kong.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Fang, Wenjing, Ph. D. Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2016-07-18T20:04:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2016-07-18T20:04:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2016</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2016</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/103724</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">953416424</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2016.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Cataloged from PDF version of thesis.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (pages 156-165).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">The aim of this thesis is two-fold: the first is to develop a reliable method for synthesizing bilayer graphene using chemical vapor deposition (CVD) method and to understand the growth mechanism. The second part involves exploring methods of synthesizing hexagonal boron nitride (hBN). The successful isolation of monolayer graphene in 2004 has attracted many researchers to search for potential applications of graphene and other two-dimensional materials in electronic and optical devices. However, the Scotch-tape method sets contraints for such applications due to the limited size and randomized location of obtained flakes. Thus, synthesizing large-area, high-quality two dimensional materials is highly desirable. This thesis seeks to develop a method to produce both bilayers and hBN with large area by CVD method and to investigate the underlying growth mechanisms for better control over the thickness, uniformity and stacking orientation.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Wenjing Fang.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">Ph.D.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">165 pages</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Electrical Engineering and Computer Science.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Synthesis of bilayer graphene and hexagonal boron nitride by chemical vapor deposition method</dim:field>
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   	&lt;Title>Synthesis of bilayer graphene and hexagonal boron nitride by chemical vapor deposition method&lt;/Title>
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   	&lt;PublicationDate>2016&lt;/PublicationDate>
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    &lt;Keyword>Electrical Engineering and Computer Science.&lt;/Keyword>
   	&lt;Abstract>The aim of this thesis is two-fold: the first is to develop a reliable method for synthesizing bilayer graphene using chemical vapor deposition (CVD) method and to understand the growth mechanism. The second part involves exploring methods of synthesizing hexagonal boron nitride (hBN). The successful isolation of monolayer graphene in 2004 has attracted many researchers to search for potential applications of graphene and other two-dimensional materials in electronic and optical devices. However, the Scotch-tape method sets contraints for such applications due to the limited size and randomized location of obtained flakes. Thus, synthesizing large-area, high-quality two dimensional materials is highly desirable. This thesis seeks to develop a method to produce both bilayers and hBN with large area by CVD method and to investigate the underlying growth mechanisms for better control over the thickness, uniformity and stacking orientation.&lt;/Abstract>
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