2026-09-22T14:15:22Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/124932022-01-13T07:54:18Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Klavis F. Jensen.
Coronell, Daniel G
Massachusetts Institute of Technology. Department of Chemical Engineering
2005-08-16T14:20:07Z
2005-08-16T14:20:07Z
1993
1993
http://hdl.handle.net/1721.1/12493
29948814
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1993.
Includes bibliographical references (leaves 288-300).
by Daniel Gene Coronell.
Ph.D.
301 leaves
17826221 bytes
17825981 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Chemical Engineering
Simulation and analysis of rarefied gas flows in chemical vapor deposition processes
Thesis
application/pdf
false
Publication
unknown
unknown
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="027576ae-05c0-4bde-bf08-96366c48dd6e">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>Simulation and analysis of rarefied gas flows in chemical vapor deposition processes</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>1993</PublicationDate>
<Authors>
<Author>
<DisplayName>Coronell, Daniel G</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Chemical Engineering</Keyword>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>