<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-20T08:57:21Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/127115" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/127115</identifier><datestamp>2024-06-24T18:30:02Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131023</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
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   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Su, Tingyu(Mechanical engineer)Massachusetts Institute of Technology.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Department of Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department" lang="en_US">Massachusetts Institute of Technology. Department of Mechanical Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2020-09-03T17:47:38Z</dim:field>
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   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2020</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2020</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">https://hdl.handle.net/1721.1/127115</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">1191836234</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis: S.M., Massachusetts Institute of Technology, Department of Mechanical Engineering, May, 2020</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Cataloged from the official PDF of thesis.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (pages 34-35).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">YFO (YFeO3) target is used for deposition on GGG (Ga3Gd5O12) substrates with different directions: (001), (110) and (111) by PLD (Pulsed Laser Deposition). HRXRD characterization shows that high-quality epitaxial garnet phase is formed on GGG substrates. However, RSM results show that the off-stoichiometric YIG film on (111) GGG substrates can remain fully strained in plane with thickness from 23 nm to 74 nm; while the samples on (001) GGG substrates show different degrees of relaxation in-plane depending on film thickness. Magnetic characterization shows that the samples grown on (111) GGG substrates have saturation magnetization Ms~45 emu/cc, which is significantly smaller than standard YIG (~140 Ms~45/emu/cc). Furthermore, the Curie temperature of samples grown on (111) GGG is ~ 310K, in obvious contrast with standard YIG ~560K.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Tingyu Su.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.M.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="collection" lang="en_US">S.M. Massachusetts Institute of Technology, Department of Mechanical Engineering</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">35 pages</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">MIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Properties of off stoichiometric yttrium iron garnet</dim:field>
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   <dim:field mdschema="mit" element="thesis" qualifier="department" lang="en_US">MechE</dim:field>
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   	&lt;Title>Properties of off stoichiometric yttrium iron garnet&lt;/Title>
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   	&lt;PublicationDate>2020&lt;/PublicationDate>
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    &lt;Keyword>Mechanical Engineering.&lt;/Keyword>
   	&lt;Abstract>YFO (YFeO3) target is used for deposition on GGG (Ga3Gd5O12) substrates with different directions: (001), (110) and (111) by PLD (Pulsed Laser Deposition). HRXRD characterization shows that high-quality epitaxial garnet phase is formed on GGG substrates. However, RSM results show that the off-stoichiometric YIG film on (111) GGG substrates can remain fully strained in plane with thickness from 23 nm to 74 nm; while the samples on (001) GGG substrates show different degrees of relaxation in-plane depending on film thickness. Magnetic characterization shows that the samples grown on (111) GGG substrates have saturation magnetization Ms~45 emu/cc, which is significantly smaller than standard YIG (~140 Ms~45/emu/cc). Furthermore, the Curie temperature of samples grown on (111) GGG is ~ 310K, in obvious contrast with standard YIG ~560K.&lt;/Abstract>
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