2026-09-19T15:04:19Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/131142022-01-13T07:54:32Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Carl V. Thompson.
Longworth, Hai Pham
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2005-08-15T16:16:34Z
2005-08-15T16:16:34Z
1992
1992
http://hdl.handle.net/1721.1/13114
26408909
Thesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992.
Includes bibliographical references (leaves 246-262).
by Hai Pham Longworth.
Sc.D.
262 leaves
19103536 bytes
19103293 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering
Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects
Thesis
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