2026-09-18T21:11:17Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/131422022-01-13T07:54:18Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Klaus F. Jensen.
Ho, Kwok-Lun
Massachusetts Institute of Technology. Department of Chemical Engineering
2005-08-15T16:28:10Z
2005-08-15T16:28:10Z
1991
1992
http://hdl.handle.net/1721.1/13142
26572000
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
Includes bibliographical references (leaves 147-152).
by Kwok-Lun Ho.
Ph.D.
vi, 152 leaves
9275950 bytes
9275708 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Chemical Engineering
Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride
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