2026-09-19T13:30:31Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/136002022-01-26T20:57:06Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
Rebecca M. Henderson and Jesús A. del Alamo.
Moran, Peter William
Massachusetts Institute of Technology. Department of Electrical Engineering
Sloan School of Management
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2005-08-10T22:16:04Z
2005-08-10T22:16:04Z
1990
1990
http://hdl.handle.net/1721.1/13600
24154943
Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990.
Includes bibliographical references (leaves 195-197).
by Peter William Moran.
M.S.
199 leaves
12487268 bytes
12487026 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Sloan School of Management
Electrical Engineering
Sub-micron gate lithography in an MMIC production environment
Thesis
application/pdf
Publication
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