2026-09-19T10:08:19Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/136402022-01-13T07:54:32Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Rafael Reif.
Yew, Tri-Rung
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2005-08-10T22:32:47Z
2005-08-10T22:32:47Z
1990
1990
http://hdl.handle.net/1721.1/13640
24250400
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.
Includes bibliographical references (leaves 204-210).
by Tri-Rung Yew.
Ph.D.
210 leaves
25288496 bytes
25288254 bytes
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eng
Massachusetts Institute of Technology
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http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering
Growth and characterization of low temperature silicon selective epitaxy
Thesis
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<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="9d7da530-559d-41c1-924e-e9fb5c816953">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>Growth and characterization of low temperature silicon selective epitaxy</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>1990</PublicationDate>
<Authors>
<Author>
<DisplayName>Yew, Tri-Rung</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Materials Science and Engineering</Keyword>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>