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   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1986.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">MICROFICHE COPY AVAILABLE IN ARCHIVES AND ENGINEERING</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Bibliography: leaves 134-139.</dim:field>
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   <dim:field mdschema="dc" element="title" lang="en_US">Characterization of chemical vapor deposited polycrystalline silicon thin films</dim:field>
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