2026-09-19T04:05:06Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/150452022-01-13T07:54:19Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Herbert H. Swain.
Allen, Kenneth Donald
Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Massachusetts Institute of Technology. Department of Chemical Engineering
2005-08-08T17:02:00Z
2005-08-08T17:02:00Z
1986
1986
http://hdl.handle.net/1721.1/15045
15495986
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986.
MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
Bibliography: leaves 319-340.
by Kenneth Donald Allen.
Ph.D.
2 v. [406 leaves]
19889251 bytes
19889005 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Chemical Engineering.
Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges
Thesis
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