2026-09-21T14:29:28Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/153102022-01-13T07:54:33Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
L. Rafael Reif.
Yu, Lock See
Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2005-08-05T21:05:27Z
2005-08-05T21:05:27Z
1985
1985
http://hdl.handle.net/1721.1/15310
13782745
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985.
MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
Includes bibliographical references.
by Lock See Yu.
M.S.
94 leaves
4160148 bytes
4159909 bytes
application/pdf
application/pdf
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering.
The effect of low energy ion bombardment on the crystallographic orientation of thin films
Thesis
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