<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-19T06:52:05Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/17676" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/17676</identifier><datestamp>2022-01-13T07:54:33Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131022</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Lionel C. Kimerling.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Cannon, Douglas Dale, 1974-</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Materials Science and Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2005-06-02T16:39:46Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2005-06-02T16:39:46Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2003</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2004</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/17676</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">55871834</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, February 2004.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (p. 131-138).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">The development of CMOS-compatible photodetectors capable of operating throughout the entire telecommunications wavelength spectrum will aid in the integration of photodetectors with Si microelectronics, thus offering a low cost platform for high performance photoreceivers. This thesis demonstrates the first CMOS process compatible high-responsivity Ge p-i-n diodes for 1.55 [mu]m wavelengths. The thermal expansion mismatch between Ge epilayers and Si substrates was used to engineer tensile strain upon cooling from the growth temperature. This 0.2% tensile strain results in a lowering of the direct transition energy in Ge by 30 meV and extends the responsivity curve to near 1.6[mu]m. Design rules are given for high speed and high responsivity, and the advantages of waveguide integration for simultaneous achievement of high speed and high responsivity are illustrated. It is shown that waveguide integration has advantages to vertical illumination when optical saturation is considered. Optical saturation will become important as photodetector sizes shrink to the order of a few tens of microns in diameter. High Ge content SiGe could have applications for a SiGe electro-optic modulator utilizing the Franz-Keldysh effect. High Ge content SiGe films have been grown on Si substrates. The Franz-Keldysh effect has been observed in our pure Ge films as an increase in responsivity with increasing reverse bias for wavelengths longer than the bandgap energy. .</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Douglas Dale Cannon.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">Ph.D.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">138 p.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent">8098671 bytes</dim:field>
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   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Materials Science and Engineering.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Strain-engineered CMOS-compatible Ge photodetectors</dim:field>
   <dim:field mdschema="dc" element="title" qualifier="alternative" lang="en_US">Strain-engineered complementary metal oxide semiconductor-compatible Ge photodetectors</dim:field>
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   	&lt;Title>Strain-engineered CMOS-compatible Ge photodetectors&lt;/Title>
   	&lt;Subtitle>Strain-engineered complementary metal oxide semiconductor-compatible Ge photodetectors&lt;/Subtitle>
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   	&lt;PublicationDate>2004&lt;/PublicationDate>
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        	&lt;DisplayName>Cannon, Douglas Dale, 1974-&lt;/DisplayName>
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    &lt;License>http://dspace.mit.edu/handle/1721.1/7582&lt;/License>
    &lt;Keyword>Materials Science and Engineering.&lt;/Keyword>
   	&lt;Abstract>The development of CMOS-compatible photodetectors capable of operating throughout the entire telecommunications wavelength spectrum will aid in the integration of photodetectors with Si microelectronics, thus offering a low cost platform for high performance photoreceivers. This thesis demonstrates the first CMOS process compatible high-responsivity Ge p-i-n diodes for 1.55 [mu]m wavelengths. The thermal expansion mismatch between Ge epilayers and Si substrates was used to engineer tensile strain upon cooling from the growth temperature. This 0.2% tensile strain results in a lowering of the direct transition energy in Ge by 30 meV and extends the responsivity curve to near 1.6[mu]m. Design rules are given for high speed and high responsivity, and the advantages of waveguide integration for simultaneous achievement of high speed and high responsivity are illustrated. It is shown that waveguide integration has advantages to vertical illumination when optical saturation is considered. Optical saturation will become important as photodetector sizes shrink to the order of a few tens of microns in diameter. High Ge content SiGe could have applications for a SiGe electro-optic modulator utilizing the Franz-Keldysh effect. High Ge content SiGe films have been grown on Si substrates. The Franz-Keldysh effect has been observed in our pure Ge films as an increase in responsivity with increasing reverse bias for wavelengths longer than the bandgap energy. .&lt;/Abstract>
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