2026-09-21T06:34:28Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/281252022-01-13T07:54:32Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Rafael Reif.
Kim, Hyoun-woo
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2005-09-26T18:37:04Z
2005-09-26T18:37:04Z
1994
1994
http://hdl.handle.net/1721.1/28125
32147490
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994.
Includes bibliographical references (leaves 138-143).
by Hyoun-woo Kim.
Ph.D.
143 leaves
8771647 bytes
8790822 bytes
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Massachusetts Institute of Technology
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http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering
Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure
Thesis
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