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Henry I. Smith. Chao, David, Ph. D. Massachusetts Institute of Technology Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science 2006-11-07T11:49:33Z 2006-11-07T11:49:33Z 2005 2005 http://hdl.handle.net/1721.1/34371 70079655 Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2005. Includes bibliographical references (p. 85-87). As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implementation of an immersion scheme in a maskless lithography system. This thesis provides a complete description of the Immersion Zone-Plate-Array Lithography (iZPAL) system. Since the zone plate component of the system is largely responsible for its lithographic performance, a thorough analysis of zone plate theory, design, and fabrication is also presented. The focusing performance of an immersion zone plate is then characterized through the experimental reconstruction of its point spread function. Finally, lithography results obtained with the iZPAL system are compared to those obtained with the non-immersion ZPAL system, demonstrating the improvement in resolution, exposure latitude, and depth-of-focus achieved with the immersion scheme. by David Chao. S.M. 87 p. 4995090 bytes 4999207 bytes application/pdf application/pdf eng Massachusetts Institute of Technology M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 Electrical Engineering and Computer Science. Development of an immersion maskless lithography system Thesis application/pdf Publication unknown unknown <Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="dd80df85-169a-4cac-bc18-4febb63493f1"> <Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type> <Language>eng</Language> <Title>Development of an immersion maskless lithography system</Title> <PublishedIn> <Publication> </Publication> </PublishedIn> <PublicationDate>2005</PublicationDate> <Authors> <Author> <DisplayName>Chao, David, Ph. D. Massachusetts Institute of Technology</DisplayName> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> </Authors> <Editors> </Editors> <Publishers> <Publisher> <DisplayName>Massachusetts Institute of Technology</DisplayName> <OrgUnit /> </Publisher> </Publishers> <License>http://dspace.mit.edu/handle/1721.1/7582</License> <Keyword>Electrical Engineering and Computer Science.</Keyword> <Abstract>As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implementation of an immersion scheme in a maskless lithography system. This thesis provides a complete description of the Immersion Zone-Plate-Array Lithography (iZPAL) system. Since the zone plate component of the system is largely responsible for its lithographic performance, a thorough analysis of zone plate theory, design, and fabrication is also presented. The focusing performance of an immersion zone plate is then characterized through the experimental reconstruction of its point spread function. Finally, lithography results obtained with the iZPAL system are compared to those obtained with the non-immersion ZPAL system, demonstrating the improvement in resolution, exposure latitude, and depth-of-focus achieved with the immersion scheme.</Abstract> <Access xmlns="http://purl.org/coar/access_right" > </Access> </Publication>