<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-20T03:26:30Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/36308" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/36308</identifier><datestamp>2022-01-13T07:54:36Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131024</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Jung-Hoon Chun and Nannaji Saka.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Eusner, Thor</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Dept. of Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Mechanical Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2007-02-21T13:25:29Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2007-02-21T13:25:29Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2006</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2006</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/36308</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">77755994</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2006.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (leaf 30).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">An important step in the manufacture of integrated circuits (ICs) is the Chemical Mechanical Polishing (CMP) process. In order to effectively use CMP, the removal rates of the materials used in ICs must be known. The removal rate of a given material by CMP can be determined once its Preston constant is known. The objectives of this work were to develop a method to determine the Preston constants and to measure the Preston constants of four low-dielectric-constant (low-k) polymers, labeled A, B, C, and D, and Cu. A weight-loss method, which measures the weight difference between the initial wafer and the polished wafer, provided repeatable results. The Preston constants ranged from 1.01 to 5.96 x10-'3 m2/N. The variation in measurements of the Preston constant ranged from 16% to 31%. The Preston constant of Cu was found to be 1.60 + 0.50 x10-13 m2/N. Of the four polymers, Polymer A had the smallest Preston constant, 1.01 i- 0.30 x10-13 m2/N. It was also determined that there is an approximate inverse linear relationship between the Preston constant of the four low-k polymers and their Young's moduli of elasticity. An approximate inverse linear relationship between the Preston constant of the four low-k polymers and the hardness was also observed.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Thor Eusner.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.B.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">30 leaves</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Determining the Preston constants of low-dielectric-constant polymers</dim:field>
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   	&lt;Title>Determining the Preston constants of low-dielectric-constant polymers&lt;/Title>
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   	&lt;PublicationDate>2006&lt;/PublicationDate>
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    &lt;Keyword>Mechanical Engineering.&lt;/Keyword>
   	&lt;Abstract>An important step in the manufacture of integrated circuits (ICs) is the Chemical Mechanical Polishing (CMP) process. In order to effectively use CMP, the removal rates of the materials used in ICs must be known. The removal rate of a given material by CMP can be determined once its Preston constant is known. The objectives of this work were to develop a method to determine the Preston constants and to measure the Preston constants of four low-dielectric-constant (low-k) polymers, labeled A, B, C, and D, and Cu. A weight-loss method, which measures the weight difference between the initial wafer and the polished wafer, provided repeatable results. The Preston constants ranged from 1.01 to 5.96 x10-&amp;apos;3 m2/N. The variation in measurements of the Preston constant ranged from 16% to 31%. The Preston constant of Cu was found to be 1.60 + 0.50 x10-13 m2/N. Of the four polymers, Polymer A had the smallest Preston constant, 1.01 i- 0.30 x10-13 m2/N. It was also determined that there is an approximate inverse linear relationship between the Preston constant of the four low-k polymers and their Young&amp;apos;s moduli of elasticity. An approximate inverse linear relationship between the Preston constant of the four low-k polymers and the hardness was also observed.&lt;/Abstract>
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