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Cardinal Warde. Dunmeyer, David Richard, 1978- Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science 2007-08-29T20:43:57Z 2007-08-29T20:43:57Z 2007 2007 http://hdl.handle.net/1721.1/38680 164432533 Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007. Includes bibliographical references (p. 173-181). The need for compact, rugged, low-cost multispectral-polarimetric filtering technology exists in both the civilian and defense communities. Such technology can be used for object detection, object recognition, and image contrast enhancement. Mosaicked multispectral-polarimetric filter technology, using CMOS-type metallo-dielectric grating structures, is presented as a potential solution in which the spectral filtering and polarization filtering functions are performed in a single component. In this work, single-layer and double-layer metallic-grating structures, embedded in uniform dielectric are investigated. Spectral tunability using only transverse grating properties in a two-layer metallic-grating structure is demonstrated. Additionally, one-layer and two-layer slotted-grid rectangular-aperture two-dimensional metallic gratings for infrared imaging are also studied. To complement the simulations, thirty-nine separate infrared optical polarization and spectral filters were fabricated in silicon using the AMI 0.5pm / MOSIS foundry service, and they were characterized using polarized FTIR analysis. Polarized transmission spectra from these CMOS-based filters compare favorably with simulation results for four of the most promising filter types. An external-cavity-coupled single-layer metallic-grating structure, compatible with CMOS microbolometer detector technology is also offered as an application example. by David R. Dunmeyer. Ph.D. 181 p. eng Massachusetts Institute of Technology M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 Electrical Engineering and Computer Science. Polarization-dependent wavelength-selective structures for multispectral polarimetric infrared imaging Thesis application/pdf false Publication unknown unknown <Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="b04793d3-1534-4b11-9bfb-9d1a2e0a867f"> <Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type> <Language>eng</Language> <Title>Polarization-dependent wavelength-selective structures for multispectral polarimetric infrared imaging</Title> <PublishedIn> <Publication> </Publication> </PublishedIn> <PublicationDate>2007</PublicationDate> <Authors> <Author> <DisplayName>Dunmeyer, David Richard, 1978-</DisplayName> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> </Authors> <Editors> </Editors> <Publishers> <Publisher> <DisplayName>Massachusetts Institute of Technology</DisplayName> <OrgUnit /> </Publisher> </Publishers> <License>http://dspace.mit.edu/handle/1721.1/7582</License> <Keyword>Electrical Engineering and Computer Science.</Keyword> <Abstract>The need for compact, rugged, low-cost multispectral-polarimetric filtering technology exists in both the civilian and defense communities. Such technology can be used for object detection, object recognition, and image contrast enhancement. Mosaicked multispectral-polarimetric filter technology, using CMOS-type metallo-dielectric grating structures, is presented as a potential solution in which the spectral filtering and polarization filtering functions are performed in a single component. In this work, single-layer and double-layer metallic-grating structures, embedded in uniform dielectric are investigated. Spectral tunability using only transverse grating properties in a two-layer metallic-grating structure is demonstrated. Additionally, one-layer and two-layer slotted-grid rectangular-aperture two-dimensional metallic gratings for infrared imaging are also studied. To complement the simulations, thirty-nine separate infrared optical polarization and spectral filters were fabricated in silicon using the AMI 0.5pm / MOSIS foundry service, and they were characterized using polarized FTIR analysis. Polarized transmission spectra from these CMOS-based filters compare favorably with simulation results for four of the most promising filter types. An external-cavity-coupled single-layer metallic-grating structure, compatible with CMOS microbolometer detector technology is also offered as an application example.</Abstract> <Access xmlns="http://purl.org/coar/access_right" > </Access> </Publication>