2026-09-20T09:42:02Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/406032022-01-13T07:54:32Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
L. Rafael Reif.
Tao, Benjamin A. (Benjamin Albert)
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2008-02-27T23:00:28Z
2008-02-27T23:00:28Z
1996
1996
http://hdl.handle.net/1721.1/40603
36004255
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
Includes bibliographical references (p. 108-111).
by Benjamin A. Tao.
M.S.
111 p.
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering
Non-perfluorocompound chemistries for plasma etching of dielectrics
Thesis
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