2026-09-20T11:12:44Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/413832022-01-13T07:54:29Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
James Chung, Duane Boning.
Chang, Eric Choong-Yin
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2008-04-23T14:53:15Z
2008-04-23T14:53:15Z
1996
1996
http://hdl.handle.net/1721.1/41383
35334677
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996.
Includes bibliographical references (leaf 109).
by Eric Choong-Yin Chang.
M.Eng.
109 leaves
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science
A statistical metrology framework for characterizing ILD thickness variation in CMP processes
Statistical metrology framework for characterizing inter-level dielectric thickness variation in chemical machine polishing.
Thesis
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