2026-09-19T07:05:27Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/435652022-01-13T07:54:29Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
Herbert H. Sawin.
Le, Minh Sy
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2008-11-07T20:12:39Z
2008-11-07T20:12:39Z
1997
1997
http://hdl.handle.net/1721.1/43565
38551262
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
Includes bibliographical references (leaves 89-91).
by Minh Sy Le.
M.S.
91 leaves
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science
Variation reduction in plasma etching via run-to-run process control and endpoint detection
Thesis
application/pdf
false
Publication
unknown
unknown
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="5b4f4cad-9134-49f6-84fa-216e6752903f">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>Variation reduction in plasma etching via run-to-run process control and endpoint detection</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>1997</PublicationDate>
<Authors>
<Author>
<DisplayName>Le, Minh Sy</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Electrical Engineering and Computer Science</Keyword>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>