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Caroline Ross. Chaube, Anay Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Department of Materials Science and Engineering 2009-04-29T17:28:59Z 2009-04-29T17:28:59Z 2008 2008 http://hdl.handle.net/1721.1/45348 316799772 Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. Includes bibliographical references (leaves 88-93). As device size decreases, conventional lithographic methods are finding it increasingly hard to keep up. Introduction of newer method such as E-beam, X-ray lithography etc. has demonstrated possibility of scaling to lower dimensions. However most of these methods are too expensive, too complex or too slow. Hence a method is required which can provide high resolutions at low cost, is easy to implement and can be integrated with current processing technologies. Block copolymer self assembly promises to do just that. An immiscible block copolymer will microphase separate into individual domains due to unfavorable mixing enthalpy. These microphase-separated blocks can have domain sizes of very low dimensions, to the order of 15-20 nms. By careful preparation, microphase-separated thin films of immiscible block copolymers can act as nanomasks for a variety of applications in electronic, optoelectronic and storage media fields. One such application is patterned media. With ever increasing areal densities, there is a limit to which the grain size within a bit can be decreased, for a conventional thin film media. Beyond a certain limit, which is dictated by the superparamagnetic effect, these grains will spontaneously reverse, resulting in undesired data loss. Patterned media has been proposed as an alternative to surpass this thermal instability criterion. In patterned media, lithographically defined nano-scale magnetic elements form single bits onto which the data is stored. Due to its unique structure in which each magnetic dots act as a single magnetic domain it can postpone the arrival of superparamagnetic effect beyond densities much higher than 10 Terabits/inch². However, very high resolutions and strict positioning control is required for its fabrication so as to attain a marketable 1Tb/inch² advantage. (cont.) Block Copolymer self assembly holds great promise in fabrication of such devices requiring periodic, high resolution pattern generation. If issues such as long range order, pattern uniformity and placement accuracy of magnetic dots can be effectively resolved, block copolymer self assembly enabled lithography can quickly become the main stay of the multimillion dollar hard disk industry. by Anay Chaube. M.Eng. 100 leaves eng Massachusetts Institute of Technology M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 Materials Science and Engineering. Self assembly of block copolymers : applicability in microelectronics and gains for patterned media Thesis application/pdf false Publication unknown unknown <Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="cd26b9e3-08da-40d3-bdf9-715474130f4e"> <Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type> <Language>eng</Language> <Title>Self assembly of block copolymers : applicability in microelectronics and gains for patterned media</Title> <PublishedIn> <Publication> </Publication> </PublishedIn> <PublicationDate>2008</PublicationDate> <Authors> <Author> <DisplayName>Chaube, Anay</DisplayName> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> </Authors> <Editors> </Editors> <Publishers> <Publisher> <DisplayName>Massachusetts Institute of Technology</DisplayName> <OrgUnit /> </Publisher> </Publishers> <License>http://dspace.mit.edu/handle/1721.1/7582</License> <Keyword>Materials Science and Engineering.</Keyword> <Abstract>As device size decreases, conventional lithographic methods are finding it increasingly hard to keep up. Introduction of newer method such as E-beam, X-ray lithography etc. has demonstrated possibility of scaling to lower dimensions. However most of these methods are too expensive, too complex or too slow. Hence a method is required which can provide high resolutions at low cost, is easy to implement and can be integrated with current processing technologies. Block copolymer self assembly promises to do just that. An immiscible block copolymer will microphase separate into individual domains due to unfavorable mixing enthalpy. These microphase-separated blocks can have domain sizes of very low dimensions, to the order of 15-20 nms. By careful preparation, microphase-separated thin films of immiscible block copolymers can act as nanomasks for a variety of applications in electronic, optoelectronic and storage media fields. One such application is patterned media. With ever increasing areal densities, there is a limit to which the grain size within a bit can be decreased, for a conventional thin film media. Beyond a certain limit, which is dictated by the superparamagnetic effect, these grains will spontaneously reverse, resulting in undesired data loss. Patterned media has been proposed as an alternative to surpass this thermal instability criterion. In patterned media, lithographically defined nano-scale magnetic elements form single bits onto which the data is stored. Due to its unique structure in which each magnetic dots act as a single magnetic domain it can postpone the arrival of superparamagnetic effect beyond densities much higher than 10 Terabits/inch². However, very high resolutions and strict positioning control is required for its fabrication so as to attain a marketable 1Tb/inch² advantage.</Abstract> <Abstract>(cont.) Block Copolymer self assembly holds great promise in fabrication of such devices requiring periodic, high resolution pattern generation. If issues such as long range order, pattern uniformity and placement accuracy of magnetic dots can be effectively resolved, block copolymer self assembly enabled lithography can quickly become the main stay of the multimillion dollar hard disk industry.</Abstract> <Access xmlns="http://purl.org/coar/access_right" > </Access> </Publication>