2026-09-20T01:52:16Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/453812022-01-13T07:54:36Zcom_1721.1_7582com_1721.1_7581col_1721.1_131024
Martin L. Culpepper.
Luttkus, Jessica (Jessica D.)
Massachusetts Institute of Technology. Dept. of Mechanical Engineering.
Massachusetts Institute of Technology. Department of Mechanical Engineering
2009-04-29T17:33:27Z
2009-04-29T17:33:27Z
2008
2008
http://hdl.handle.net/1721.1/45381
317304327
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2008.
Includes bibliographical references (p. 29).
A manufacturing line to support dip pen nanolithography on a massive scale is justified and described. Appropriate machines are evaluated based on key parameters such as cost, rate, and resolution. Methods for comparing lines are discussed, and solutions for lowest cost and fastest lines are provided.
by Jessica Luttkus.
S.B.
29 p.
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
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http://dspace.mit.edu/handle/1721.1/7582
Mechanical Engineering.
Development of a nanomanufacturing line to support dip-pen nanolithography on a massive scale
Thesis
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Publication
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