<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-20T11:16:10Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/50454" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/50454</identifier><datestamp>2021-07-05T14:03:20Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131023</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">David K. Roylance.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Chiang, Diana C. (Diana Chih-Chan), 1975-</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department" lang="en_US">Massachusetts Institute of Technology. Department of Materials Science and Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2010-01-07T20:41:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2010-01-07T20:41:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">1998</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">1998</dim:field>
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   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">42075763</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (leaf 34).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">Six underfill materials were examined for the selection of an appropriate underfill material for Digital Equipment Corporation's flip chip development project. Several tests were performed to determine the material properties, process properties, and the reliability of each underfill material. A material with a fast flow rate, uniform and void free flow pattern, fast curing schedule, good thermal and mechanical properties, and good reliability results is needed to satisfy the requirements for this project. Materials F and E exhibited all the above requirements and were concluded as the two best underfill materials for the flip chip process. Important material properties which contributed to the desired results of these materials include a filler particle content of about 65%, a weight loss percentage during cure of less than 1%, and a Tg of 140°C.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Diana C. Chiang.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.M.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">34 leaves</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
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copyright. They may be viewed from this source for any purpose, but &#xd;
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   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Materials Science and Engineering</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Underfill material selection for flip chip technology</dim:field>
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   	&lt;Title>Underfill material selection for flip chip technology&lt;/Title>
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   	&lt;PublicationDate>1998&lt;/PublicationDate>
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        	&lt;DisplayName>Chiang, Diana C. (Diana Chih-Chan), 1975-&lt;/DisplayName>
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    &lt;Keyword>Materials Science and Engineering&lt;/Keyword>
   	&lt;Abstract>Six underfill materials were examined for the selection of an appropriate underfill material for Digital Equipment Corporation&amp;apos;s flip chip development project. Several tests were performed to determine the material properties, process properties, and the reliability of each underfill material. A material with a fast flow rate, uniform and void free flow pattern, fast curing schedule, good thermal and mechanical properties, and good reliability results is needed to satisfy the requirements for this project. Materials F and E exhibited all the above requirements and were concluded as the two best underfill materials for the flip chip process. Important material properties which contributed to the desired results of these materials include a filler particle content of about 65%, a weight loss percentage during cure of less than 1%, and a Tg of 140°C.&lt;/Abstract>
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