<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-19T10:47:47Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/50627" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/50627</identifier><datestamp>2022-01-13T07:54:33Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131023</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Michael J. Cima.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Rosenthal, Matthew E. (Matthew Eric), 1971-</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Materials Science and Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2010-01-07T21:03:14Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2010-01-07T21:03:14Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">1998</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">1998</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/50627</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">47921863</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (leaves 110-113).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">A forming process for creating MEMS and mesoscale ceramic parts with micron scale features has been developed. This micromolding process takes advantage of clean room compatible techniques to create silicon etchings, which are used to create a silicone transfer mold. The silicone molds are used to make numerous sacrificial mold into which ceramic slurry is cast. The wax molds are sacrificed leaving green ceramic parts which are fired to produce the final component. The process was found to reproduce features as small as 2 gm with a tolerance of ± 0.8 pm over about a 100 pm length scale. The production of several parts are examined, demonstrating the ability to make stand alone MEMS and mesoscale parts with complex geometries. A non-ceramic application involving precise particle arrangement is also discussed. Observations regarding part quality, defect formation, yield issues, and process enhancement are made, along with a characterization of the dimensional stability of the process. The costs associated with processing silicon molds are also compared to competing processing techniques. This technique has generated excellent results and has potential to become a major forming tool to fill the materials selection gap in MEMS and mesoscale component design.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Matthew E. Rosenthal.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.M.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">113 leaves</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by &#xd;
copyright. They may be viewed from this source for any purpose, but &#xd;
reproduction or distribution in any format is prohibited without written &#xd;
permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Materials Science and Engineering.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Ceramic microforming process</dim:field>
   <dim:field mdschema="dc" element="type" lang="en_US">Thesis</dim:field>
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   	&lt;Title>Ceramic microforming process&lt;/Title>
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   	&lt;PublicationDate>1998&lt;/PublicationDate>
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        	&lt;DisplayName>Rosenthal, Matthew E. (Matthew Eric), 1971-&lt;/DisplayName>
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    &lt;License>http://dspace.mit.edu/handle/1721.1/7582&lt;/License>
    &lt;Keyword>Materials Science and Engineering.&lt;/Keyword>
   	&lt;Abstract>A forming process for creating MEMS and mesoscale ceramic parts with micron scale features has been developed. This micromolding process takes advantage of clean room compatible techniques to create silicon etchings, which are used to create a silicone transfer mold. The silicone molds are used to make numerous sacrificial mold into which ceramic slurry is cast. The wax molds are sacrificed leaving green ceramic parts which are fired to produce the final component. The process was found to reproduce features as small as 2 gm with a tolerance of ± 0.8 pm over about a 100 pm length scale. The production of several parts are examined, demonstrating the ability to make stand alone MEMS and mesoscale parts with complex geometries. A non-ceramic application involving precise particle arrangement is also discussed. Observations regarding part quality, defect formation, yield issues, and process enhancement are made, along with a characterization of the dimensional stability of the process. The costs associated with processing silicon molds are also compared to competing processing techniques. This technique has generated excellent results and has potential to become a major forming tool to fill the materials selection gap in MEMS and mesoscale component design.&lt;/Abstract>
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