2026-09-19T23:49:28Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/580702022-01-13T07:54:33Zcom_1721.1_7582com_1721.1_7581col_1721.1_131024
Caroline A. Ross.
Perkinson, Joy C. (Joy Clare)
Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
Massachusetts Institute of Technology. Department of Materials Science and Engineering
2010-09-01T16:23:40Z
2010-09-01T16:23:40Z
2009
2009
http://hdl.handle.net/1721.1/58070
630087841
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 35).
Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of "blocks" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ...
by Joy C. Perkinson.
S.B.
35 p.
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Materials Science and Engineering.
The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films
Thesis
application/pdf
false
Publication
unknown
unknown
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="58404cd3-1a91-4304-a7f8-ccc8c35b7f10">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>2009</PublicationDate>
<Authors>
<Author>
<DisplayName>Perkinson, Joy C. (Joy Clare)</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Materials Science and Engineering.</Keyword>
<Abstract>Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of "blocks" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ...</Abstract>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>