<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-19T05:22:08Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/62105" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/62105</identifier><datestamp>2022-01-13T07:54:29Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131023</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Karl K. Berggren.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Korre, Hasan</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2011-04-04T17:43:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2011-04-04T17:43:16Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2010</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2010</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/62105</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">707936872</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Cataloged from PDF version of thesis.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (p. 61-63).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">Interference lithography is a technique for making one- and two-dimensional periodic nanostructures using interference of two coherent light beams. Despite their successes, the size, maintenance, and cost of interference lithography tools have prevented periodic nanostructures from being ubiquitous in academia and industry. Here, a novel approach is described whereby the conventional optical source - a bulky and expensive metal-vapor laser - is replaced by a newly available, low-cost blue laser diode. Additionally, the passive alignment of a lens tube is utilized to simplify the construction of a spatial filter. The resulting custom-built interference lithography tool is able to print large-area (~ cm2 ) periodic patterns. The tool has a small footprint (~0.2 M2 ) and can be assembled for less than 6000 USD.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Hasan Korre.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.M.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">63 p.</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by 
copyright. They may be viewed from this source for any purpose, but 
reproduction or distribution in any format is prohibited without written 
permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Electrical Engineering and Computer Science.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">On the development of a low-cost lithographic interferometer</dim:field>
   <dim:field mdschema="dc" element="type" lang="en_US">Thesis</dim:field>
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   <dim:field mdschema="others" element="access-status">unknown</dim:field>
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	&lt;Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843&lt;/Type>
	&lt;Language>eng&lt;/Language>
   	&lt;Title>On the development of a low-cost lithographic interferometer&lt;/Title>
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   	&lt;PublicationDate>2010&lt;/PublicationDate>
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        	&lt;DisplayName>Korre, Hasan&lt;/DisplayName>
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            &lt;DisplayName>Massachusetts Institute of Technology&lt;/DisplayName>
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    &lt;License>http://dspace.mit.edu/handle/1721.1/7582&lt;/License>
    &lt;Keyword>Electrical Engineering and Computer Science.&lt;/Keyword>
   	&lt;Abstract>Interference lithography is a technique for making one- and two-dimensional periodic nanostructures using interference of two coherent light beams. Despite their successes, the size, maintenance, and cost of interference lithography tools have prevented periodic nanostructures from being ubiquitous in academia and industry. Here, a novel approach is described whereby the conventional optical source - a bulky and expensive metal-vapor laser - is replaced by a newly available, low-cost blue laser diode. Additionally, the passive alignment of a lens tube is utilized to simplify the construction of a spatial filter. The resulting custom-built interference lithography tool is able to print large-area (~ cm2 ) periodic patterns. The tool has a small footprint (~0.2 M2 ) and can be assembled for less than 6000 USD.&lt;/Abstract>
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