2026-09-20T23:31:56Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/653252022-01-13T07:54:29Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
Marc A. Baldo.
Bahlke, Matthias Erhard
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2011-08-18T19:18:58Z
2011-08-18T19:18:58Z
2011
2011
http://hdl.handle.net/1721.1/65325
746081955
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 39-42).
Photolithography's accuracy and scalability has made it the method for sub-micron-scale definition of single-crystal semiconductor devices for over half a century. Unfortunately, organic semiconductor devices are chemically incompatible with the types of resists, solvents, and etchants traditionally used. This work investigates the use of a chemically inert resist that relies on phase changes for lift-off patterning thin films of organic semiconductors and metals.
by Matthias Erhard Bahlke.
S.M.
42 p.
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
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http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science.
A novel sublimable mask lift-off method for patterning thin films
Thesis
application/pdf
Publication
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unknown
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