2026-09-19T13:29:40Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/685042022-01-13T07:54:29Zcom_1721.1_7582com_1721.1_7581col_1721.1_131023
Karl K. Berggren.
Manfrinato, Vitor Riseti
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2012-01-12T19:32:57Z
2012-01-12T19:32:57Z
2011
2011
http://hdl.handle.net/1721.1/68504
770675473
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 53-55).
This thesis presents the investigation of resolution limits of electron-beam lithography (EBL) at the sub-10-nm scale. EBL patterning was investigated at low electron energy (2 keV) in a converted scanning electron microscope and at high electron energy (200 keV) in an aberration-corrected scanning transmission electron microscope. Sub-10-nm structures were fabricated and proximity effects were evaluated in both conditions. As an application of sub-10-nm EBL, this thesis presents a templated-self-assembly technique to control the position of individual colloidal quantum dots smaller than 10 nm.
by Vitor Riseti Manfrinato.
S.M.
55 p.
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by
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http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science.
Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots
Thesis
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