<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-20T00:09:24Z</responseDate><request verb="GetRecord" identifier="oai:dspace.mit.edu:1721.1/82298" metadataPrefix="dim">https://dspace.mit.edu/server/oai/request</request><GetRecord><record><header><identifier>oai:dspace.mit.edu:1721.1/82298</identifier><datestamp>2022-01-13T07:54:05Z</datestamp><setSpec>com_1721.1_7582</setSpec><setSpec>com_1721.1_7581</setSpec><setSpec>col_1721.1_131023</setSpec></header><metadata><dim:dim xmlns:dim="http://www.dspace.org/xmlns/dspace/dim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.dspace.org/xmlns/dspace/dim http://www.dspace.org/schema/dim.xsd">
   <dim:field mdschema="dc" element="contributor" qualifier="advisor" lang="en_US">Tonio Buonassisi.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="author" lang="en_US">Siah, Sin Cheng</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="other" lang="en_US">Massachusetts Institute of Technology. Department of Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="contributor" qualifier="department">Massachusetts Institute of Technology. Department of Mechanical Engineering</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="accessioned">2013-11-18T19:05:38Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="available">2013-11-18T19:05:38Z</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="copyright" lang="en_US">2013</dim:field>
   <dim:field mdschema="dc" element="date" qualifier="issued" lang="en_US">2013</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="uri">http://hdl.handle.net/1721.1/82298</dim:field>
   <dim:field mdschema="dc" element="identifier" qualifier="oclc" lang="en_US">861347367</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2013.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Cataloged from PDF version of thesis.</dim:field>
   <dim:field mdschema="dc" element="description" lang="en_US">Includes bibliographical references (p. 84-86).</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="abstract" lang="en_US">One of the key technological objectives to further decrease the cost of silicon (Si) PV and enable manufacturing of crystalline silicon is to improve the quality of thin, kerfless Si wafers to monocrystalline equivalent. To aid wafer manufacturers to develop high-quality thin Si wafer substrates, performance-limiting defects in the bulk of thin kerfless Si wafers must be identified, and a means to accurately measure the bulk lifetime is necessary. With decreasing wafer thickness, however, the impact of surface recombination increases and dominates the effective lifetime measured by conventional methods. Therefore, the ability to decouple bulk-limited lifetime from surface-limited lifetime is desirable, ideally without the need for surface passivation. Herein, spectrally resolved transient absorption pump-probe spectroscopy and extensive Technology Computer Aided Design simulations are used to decouple the bulk- and surface-limited lifetimes of thin kerfless silicon wafers in a single measurement. A range of sample conditions are studied. It is observed that the technique can successfully provide reasonable upper and lower limits to the bulk and surface recombination parameters for thin kerfless silicon wafers.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="statementofresponsibility" lang="en_US">by Sin Cheng Siah.</dim:field>
   <dim:field mdschema="dc" element="description" qualifier="degree" lang="en_US">S.M.</dim:field>
   <dim:field mdschema="dc" element="format" qualifier="extent" lang="en_US">86 p.</dim:field>
   <dim:field mdschema="dc" element="language" qualifier="iso" lang="en_US">eng</dim:field>
   <dim:field mdschema="dc" element="publisher" lang="en_US">Massachusetts Institute of Technology</dim:field>
   <dim:field mdschema="dc" element="rights" lang="en_US">M.I.T. theses are protected by 
copyright. They may be viewed from this source for any purpose, but 
reproduction or distribution in any format is prohibited without written 
permission. See provided URL for inquiries about permission.</dim:field>
   <dim:field mdschema="dc" element="rights" qualifier="uri" lang="en_US">http://dspace.mit.edu/handle/1721.1/7582</dim:field>
   <dim:field mdschema="dc" element="subject" lang="en_US">Mechanical Engineering.</dim:field>
   <dim:field mdschema="dc" element="title" lang="en_US">Decoupling bulk- and surface-limited lifetimes in thin kerfless silicon wafers using spectrally resolved transient absorption pump-probe spectroscopy and computer simulations</dim:field>
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   	&lt;Title>Decoupling bulk- and surface-limited lifetimes in thin kerfless silicon wafers using spectrally resolved transient absorption pump-probe spectroscopy and computer simulations&lt;/Title>
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   	&lt;PublicationDate>2013&lt;/PublicationDate>
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        	&lt;DisplayName>Siah, Sin Cheng&lt;/DisplayName>
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            &lt;DisplayName>Massachusetts Institute of Technology&lt;/DisplayName>
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    &lt;License>http://dspace.mit.edu/handle/1721.1/7582&lt;/License>
    &lt;Keyword>Mechanical Engineering.&lt;/Keyword>
   	&lt;Abstract>One of the key technological objectives to further decrease the cost of silicon (Si) PV and enable manufacturing of crystalline silicon is to improve the quality of thin, kerfless Si wafers to monocrystalline equivalent. To aid wafer manufacturers to develop high-quality thin Si wafer substrates, performance-limiting defects in the bulk of thin kerfless Si wafers must be identified, and a means to accurately measure the bulk lifetime is necessary. With decreasing wafer thickness, however, the impact of surface recombination increases and dominates the effective lifetime measured by conventional methods. Therefore, the ability to decouple bulk-limited lifetime from surface-limited lifetime is desirable, ideally without the need for surface passivation. Herein, spectrally resolved transient absorption pump-probe spectroscopy and extensive Technology Computer Aided Design simulations are used to decouple the bulk- and surface-limited lifetimes of thin kerfless silicon wafers in a single measurement. A range of sample conditions are studied. It is observed that the technique can successfully provide reasonable upper and lower limits to the bulk and surface recombination parameters for thin kerfless silicon wafers.&lt;/Abstract>
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