2026-09-23T20:44:55Zhttps://dspace.mit.edu/server/oai/requestoai:dspace.mit.edu:1721.1/910432026-06-17T14:47:03Zcom_1721.1_7582com_1721.1_7581col_1721.1_131022
Marc A. Baldo.
Bahlke, Matthias Erhard
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
2014-10-21T16:20:57Z
2014-10-21T16:20:57Z
2014
2014
http://hdl.handle.net/1721.1/91043
893128909
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2014.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
136
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 73-84).
Photolithography's accuracy and scalability have made it the method for sub-micronscale definition of single-crystal semiconductor devices for over half a century. The ultimate goal for OLED manufacturing, however, is to replicate the widespread success of photoresist lithography without the use of the types of resists, solvents, and etchants traditionally used--organic small molecules are simply not compatible with these tools. Hence, there is motivation for a renewed examination of variants of this inherently parallel, high speed approach. This work investigates the use of chemically inert resists that rely on clearance mechanisms not found in traditional lithography. These primarily include employing phase changes for lift-off patterning thin films of organic semiconductors and metals, and also propose and discuss the use of combustible and magnetic materials.
by Matthias Erhard Bahlke.
Ph.D.
108 pages
eng
Massachusetts Institute of Technology
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Electrical Engineering and Computer Science.
Alternative methods and materials for patterning organic thin film electronics
Thesis
application/pdf
false
Publication
unknown
unknown
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="cd54aca2-519c-429e-817e-28557656d245">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>eng</Language>
<Title>Alternative methods and materials for patterning organic thin film electronics</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>2014</PublicationDate>
<Authors>
<Author>
<DisplayName>Bahlke, Matthias Erhard</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<DisplayName>Massachusetts Institute of Technology</DisplayName>
<OrgUnit />
</Publisher>
</Publishers>
<License>http://dspace.mit.edu/handle/1721.1/7582</License>
<Keyword>Electrical Engineering and Computer Science.</Keyword>
<Abstract>Photolithography's accuracy and scalability have made it the method for sub-micronscale definition of single-crystal semiconductor devices for over half a century. The ultimate goal for OLED manufacturing, however, is to replicate the widespread success of photoresist lithography without the use of the types of resists, solvents, and etchants traditionally used--organic small molecules are simply not compatible with these tools. Hence, there is motivation for a renewed examination of variants of this inherently parallel, high speed approach. This work investigates the use of chemically inert resists that rely on clearance mechanisms not found in traditional lithography. These primarily include employing phase changes for lift-off patterning thin films of organic semiconductors and metals, and also propose and discuss the use of combustible and magnetic materials.</Abstract>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>