2026-09-18T23:38:50Zhttps://dspace.mit.edu/server/oai/request

oai:dspace.mit.edu:1721.1/986642022-01-13T07:55:22Zcom_1721.1_7582com_1721.1_7581col_1721.1_131024

Caroline Ross. Pan, Annia (An N.) Massachusetts Institute of Technology. Department of Materials Science and Engineering. Massachusetts Institute of Technology. Department of Materials Science and Engineering 2015-09-17T19:03:12Z 2015-09-17T19:03:12Z 2015 2015 http://hdl.handle.net/1721.1/98664 920678713 Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering, 2015. Cataloged from PDF version of thesis. Includes bibliographical references (pages 39-40). The self-assembly of block copolymers (BCP) has been a promising area of research for nanolithography applications in microelectronics because of their ability to produce nano-scale level periodic structures with long-range order. Ideal BCPs for generating these nano-scale patterns fall within the strong segregation limit (SSL) and have a high interaction parameter to drive BCP phase transitions. BCP morphologies can vary from equilibrium structures such as spheres, cylinders, and gyroid, to metastable structures such as hexagonal perforated lamellar (HPL). A variety of processing techniques including solvent vapor annealing (SVA) have been developed in order to facilitate the phase transitions of BCPs from disordered to ordered states. SVA parameters which can affect the final film morphology include the swelling thickness of the film and solvent removal rate. Thermal modulation of the substrate was used to explore the effects of rapid solvent evaporation during the annealing process on the morphologies of the PS₁₆-b-PDMS₃₇ system. Additional cycles of solvent update and film reswelling were introduced into the annealing procedure to induce greater long-range ordering of film morphologies. Although a range of morphologies were explored, there was special focus on developing a procedure for mono-layer HPL structures for nanolithography applications. by Annia Pan. S.B. 40 pages eng Massachusetts Institute of Technology M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 Materials Science and Engineering. Thermal modulation during solvent annealing of PS-PDMS block copolymer Thesis application/pdf false Publication unknown unknown <Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="5248320a-849e-4a30-94b5-8b422f671ed5"> <Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type> <Language>eng</Language> <Title>Thermal modulation during solvent annealing of PS-PDMS block copolymer</Title> <PublishedIn> <Publication> </Publication> </PublishedIn> <PublicationDate>2015</PublicationDate> <Authors> <Author> <DisplayName>Pan, Annia (An N.)</DisplayName> <Affiliation> <OrgUnit> </OrgUnit> </Affiliation> </Author> </Authors> <Editors> </Editors> <Publishers> <Publisher> <DisplayName>Massachusetts Institute of Technology</DisplayName> <OrgUnit /> </Publisher> </Publishers> <License>http://dspace.mit.edu/handle/1721.1/7582</License> <Keyword>Materials Science and Engineering.</Keyword> <Abstract>The self-assembly of block copolymers (BCP) has been a promising area of research for nanolithography applications in microelectronics because of their ability to produce nano-scale level periodic structures with long-range order. Ideal BCPs for generating these nano-scale patterns fall within the strong segregation limit (SSL) and have a high interaction parameter to drive BCP phase transitions. BCP morphologies can vary from equilibrium structures such as spheres, cylinders, and gyroid, to metastable structures such as hexagonal perforated lamellar (HPL). A variety of processing techniques including solvent vapor annealing (SVA) have been developed in order to facilitate the phase transitions of BCPs from disordered to ordered states. SVA parameters which can affect the final film morphology include the swelling thickness of the film and solvent removal rate. Thermal modulation of the substrate was used to explore the effects of rapid solvent evaporation during the annealing process on the morphologies of the PS₁₆-b-PDMS₃₇ system. Additional cycles of solvent update and film reswelling were introduced into the annealing procedure to induce greater long-range ordering of film morphologies. Although a range of morphologies were explored, there was special focus on developing a procedure for mono-layer HPL structures for nanolithography applications.</Abstract> <Access xmlns="http://purl.org/coar/access_right" > </Access> </Publication>