| dc.contributor.advisor | Wilfred Veldkamp. | en_US |
| dc.contributor.author | Owens, Anthony L. (Anthony LeRoy) | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. | en_US |
| dc.date.accessioned | 2018-08-22T14:28:49Z | |
| dc.date.available | 2018-08-22T14:28:49Z | |
| dc.date.copyright | 1988 | en_US |
| dc.date.issued | 1988 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/117459 | |
| dc.description | Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1988. | en_US |
| dc.description | Includes bibliographical references. | en_US |
| dc.description.statementofresponsibility | by Anthony L. Owens. | en_US |
| dc.format.extent | 63 [i.e. 84] leaves | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science. | en_US |
| dc.title | Automated mask aligner for multilevel mask exposures | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | B.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 19592129 | en_US |
