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dc.contributor.advisorHae-Seung Lee.en_US
dc.contributor.authorTewksbury, Theodore L. (Theodore Locke)en_US
dc.date.accessioned2008-04-24T08:49:20Z
dc.date.available2008-04-24T08:49:20Z
dc.date.copyright1992en_US
dc.date.issued1992en_US
dc.identifier.urihttp://dspace.mit.edu/handle/1721.1/13238en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/13238
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1992.en_US
dc.descriptionIncludes bibliographical references (p. 299-317).en_US
dc.description.statementofresponsibilityby Theodore L. Tewksbury III.en_US
dc.format.extentxvii, 317 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/13238en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleRelaxation effects in MOS devices due to tunnel exchange with near-interface oxide trapsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc26912439en_US


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