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High-accuracy, speed-optimized positioning system for electron beam lithography

dc.contributor.authorDadok, Luděk.en_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2025-03-12T16:07:04Z
dc.date.available2025-03-12T16:07:04Z
dc.date.copyright1982en_US
dc.date.issued1982en_US
dc.identifier.urihttps://hdl.handle.net/1721.1/158470
dc.descriptionThesis: M.S., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1982en_US
dc.descriptionVita.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibilityby Luděk Dadok.en_US
dc.format.extent115 leavesen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsMIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.subject.lcshLithography, Electron beam.en_US
dc.subject.lcshDigital control systems.en_US
dc.subject.lcshIntegrated circuits.en_US
dc.subject.lcshMiniature electronic equipment.en_US
dc.subject.otherMiniature electronic equipment. fasten_US
dc.subject.otherIntegrated circuits. fasten_US
dc.subject.otherDigital control systems. fasten_US
dc.subject.otherLithography, Electron beam. fasten_US
dc.titleHigh-accuracy, speed-optimized positioning system for electron beam lithographyen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Scienceen_US
dc.identifier.oclc11836111en_US
dc.description.collectionM.S. Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Scienceen_US
dspace.imported2025-03-12T16:07:04Zen_US
mit.thesis.degreeMasteren_US


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