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dc.contributor.advisorSuzanne Romaine and Sow-Hsin Chen.en_US
dc.contributor.authorIvan, Adrian, 1964-en_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Nuclear Engineering.en_US
dc.date.accessioned2006-03-24T18:11:09Z
dc.date.available2006-03-24T18:11:09Z
dc.date.copyright2002en_US
dc.date.issued2002en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/30006
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Nuclear Engineering, 2002.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.abstractThis study investigated the growth of multilayers with depth-graded thicknesses and their performance as x- ray mirrors for the next generation of focusing telescopes. Different material combinations were studied for the first time employing a consistent methodology for the DC magnetron sputtering growth of the multilayers and their characterization by x-ray reflectivity (XRR) measurements. The width of the interfaces was identified as the most important factor that must be controlled and minimized to achieve high reflectivity. The optimization of the process parameters led to interface widths ([sigma]) of 3.0-4.5 [angstroms] for both W/Si and Pt/C, the most interesting materials for this application. The other material combinations studied were: W/C, Mo/Si, Ni/C, Ni-V/C, WSi₂/Si, and Nb/Si. The interface widths for W/C were about 4 [angstroms], but wider ([sigma] [greater than or equal to] 7 [angstroms]) for Mo/Si and Ni/C. The analysis indicated that the large Mo/Si interface width was due to the formation of a silicide compound. In the case of Ni/C, TEM and XRR measurements concurred to an island growth mode of nickel for thicknesses less than 17 [angstroms], resulting in a high roughness at the C-on-Ni interface. A trial with WSi₂/Si multilayers showed values of sigma comparable to the simpler W/Si system. For Nb/Si the interface widths were larger than 9 [angstroms]. Depth graded W/Si, Pt/C, and W/C multilayers were deposited on flat substrates in process conditions optimized for low [sigma] (3-5 [angstroms]). Their x-ray reflectivity was measured at high energy using synchrotron radiation sources and confirmed the designs for the structure of the multilayers and the reflection bandpass.en_US
dc.description.abstract(cont.) The reflectivity was between 20 and 40 % for grazing incidence angles used in hard x-ray focusing telescopes. One of the deposition chambers built for this study has the unique capability to coat with multilayers the inside of integral conical shells that compose the telescope mirror system. We have accomplished for the first time this type of coatings and present results from their x-ray measurements.en_US
dc.description.statementofresponsibilityby Adrian Ivan.en_US
dc.format.extent243 p.en_US
dc.format.extent11505273 bytes
dc.format.extent11505074 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectNuclear Engineering.en_US
dc.titleFabrication and characterization of multilayers for focusing hard x-ray opticsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Engineeringen_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineering
dc.identifier.oclc55011821en_US


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