Sub-20nm substrate patterning using a self-assembled nanocrystal template

Abstract

A hexagonally close-packed monolayer of lead selenide quantum dots is presented as a template for patterning with a tunable resolution from 2 to 20nm. Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. The physics behind the possible modification of silicon's electronic band gap due to our nano-patterning is also presented.